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Industry

ASML High-NA EUV in sight; will it open opportunities for Korean mask makers?

Technology and production preparations in the mask industry for ASML\'s next-generation High-NA EUV lithography tools are accelerating as DRAM makers and foundries firm up adoption timelines. Industry schedules point to mass-production introductions starting from 2028. While Japanese suppliers have effectively dominated EUV mask materials, Korean companies are seeking entry through certifications for EUV pellicles and blank masks and expanding related capacity and customer qualification testing.

AI & Enterprise

Dassault Systemes, Vertiv team up to validate AI factory infrastructure in virtual environment before buildout

Dassault Systemes said on Thursday it will work with digital infrastructure company Vertiv to accelerate the design and buildout of AI factories. The two companies will combine Dassault Systemes\' 3DEXPERIENCE agentic platform with Vertiv\'s digital infrastructure expertise to configure, simulate and validate Nvidia DSX AI factory infrastructure in a virtual environment before deploying it on site. They aim to cut complexity during installation and shorten time to full operation.

AI & Enterprise

Red Hat expands cooperation with Nvidia to strengthen agentic AI security capabilities

Red Hat said on Wednesday it is expanding cooperation with Nvidia and will work to spread security-enabled, enterprise-grade agentic AI across open hybrid clouds through Red Hat AI Factory with NVIDIA. The company said it is developing the OpenShell Reference Architecture with Nvidia to secure safety and control at the core of enterprise agentic AI deployments. It said the architecture combines access control, an AI gateway and high-performance inference with Nvidia technologies.