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ASML High-NA EUV in sight; will it open opportunities for Korean mask makers?

Technology and production preparations in the mask industry for ASML\'s next-generation High-NA EUV lithography tools are accelerating as DRAM makers and foundries firm up adoption timelines. Industry schedules point to mass-production introductions starting from 2028. While Japanese suppliers have effectively dominated EUV mask materials, Korean companies are seeking entry through certifications for EUV pellicles and blank masks and expanding related capacity and customer qualification testing.