Search results for photomask
Industry
Samsung Electronics to adopt ASML high-NA EUV for DRAM in 2028
Samsung Electronics said on Tuesday it has joined ASML\'s large mask consortium to co-develop next-generation 12-inch photomasks and plans to introduce high-NA EUV tools into advanced DRAM manufacturing by 2028. The shift from 6-inch to 12-inch masks alongside high-NA EUV is aimed at easing stitching constraints, boosting fab productivity and lowering chip manufacturing costs. Samsung and ASML also plan to strengthen cooperation and seek further collaboration opportunities.
Industry
Zeiss opens semiconductor innovation center in Yongin
Zeiss has set up a base in Yongin to strengthen cooperation with its South Korean semiconductor customers. The company said on Thursday it opened the Zeiss Semiconductor Innovation Center, its first global hub for its semiconductor unit, in a semiconductor equipment cluster run by Surplus Global. The 350 square-metre facility houses photomask and high-precision metrology and inspection solutions and aims to support mass production and advanced packaging for Korean customers.
Industry
TSMC dominance shows cracks, boosting Samsung foundry opportunity
The foundry market is entering a new phase as TSMC’s grip shows signs of weakening amid advanced packaging bottlenecks, opening room for rivals. Counterpoint Research said global foundry revenue rose 16 percent last year to $320 billion on steady AI chip demand. It expects TSMC’s share to slip this year, with Samsung and SMIC moving in. Samsung is pushing 2-nanometre production, while SMIC expands capacity and Intel seeks large AI customers.
