Industry
China aims for 5 nm without EUV by 2029, unveils 2D semiconductor pilot line
Chinese semiconductor startup Yuanjiyue unveiled what it called the world’s first 8-inch pilot production line for 2D semiconductors and set a goal of developing 5 nm-class chips without EUV lithography by 2029. The company said the line supports the full process from material preparation to tape-out and signals a move beyond lab research. Chairman Bao Wenzhong said it aims to build a process equivalent to 90 nm silicon this year and develop a fully domestic process by 2029.
